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Three-dimensional compatible sacrificial nanoimprint lithography for tuning the wettability of thermoplastic materials
Accepted manuscript   Open access   Peer reviewed

Three-dimensional compatible sacrificial nanoimprint lithography for tuning the wettability of thermoplastic materials

Molla Hasan, Imrhankhan Shajahan, Manesh Gopinadhan, Jittisa Ketkaew, Aaron Anesgar, Chloe Cho, Saransh Chopra, Michael Higgins, Saira Reyes, Jan Schroers, …
Journal of Micro- and Nano-Manufacturing, Vol.6(4), pp.041003(1)-041003(8)
2018
DOI:
https://doi.org/10.7282/T3TM7FRN

Abstract

Superhydrophobicity Thermoplastic forming Copolymer Metallic glass
We report the tuning of surface wetting through sacrificial nanoimprint lithography (SNIL). In this process, grown ZnO nanomaterials are transferred by imprint into a metallic glass (MG) and an elastomeric material, and then etched to impart controlled surface roughness. This process increases the hydrophilicity and hydrophobicity of both surfaces, the Pt57.5Cu14.7Ni5.3P22.5 MG and thermoplastic elastomer (TPE), respectively. The growth conditions of the ZnO change the characteristic length scale of the roughness, which in turn alters the properties of the patterned surface. The novelty of this approach includes reusability of templates and that it is able to create superhydrophilic and superhydrophobic surfaces in a manner compatible with the fabrication of macroscopic three-dimensional (3D) parts. Because the wettability is achieved by only modifying topography, without using any chemical surface modifiers, the prepared surfaces are relatively more durable.
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Accepted Manuscript (AM) Open Access
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https://dx.doi.org/10.1115/1.4041532View
Version of Record (VoR) Journal of Micro- and Nano-Manufacturing
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