- Title
- Measuring the EUV-induced contamination rates of TiO2-capped multilayer optics by anticipated production-environment hydrocarbons
- Creators
- S. B Hill - National Institute of Standards and Technology, Gaithersburg, MD 20899, United StatesN. S Faradzhev - Dept. of Physics and Astronomy, and Laboratory for Surface Modification, Rutgers, The State University of New Jersey, Piscataway NJ 08854, United StatesC. S Tarrio - National Institute of Standards and Technology, Gaithersburg, MD 20899, United StatesT. B Lucatorto - National Institute of Standards and Technology, Gaithersburg, MD 20899, United StatesR. A Bartynski - Dept. of Physics and Astronomy, and Laboratory for Surface Modification, Rutgers, The State University of New Jersey, Piscataway NJ 08854, United StatesB. V Yakshinskiy - Dept. of Physics and Astronomy, and Laboratory for Surface Modification, Rutgers, The State University of New Jersey, Piscataway NJ 08854, United StatesT. E Madey - Dept. of Physics and Astronomy, and Laboratory for Surface Modification, Rutgers, The State University of New Jersey, Piscataway NJ 08854, United States
- Publication Details
- Proceedings of SPIE, the International Society for Optical Engineering, Vol.7271
- Conference
- Alternative lithographic technologies (24-26 February 2009, San Jose, California, United States)
- Date published
- 2009
- Publisher
- SPIE
- Academic Unit
- Laboratory for Surface Modification
- Language
- English
- Resource Type
- Conference proceeding
- Identifiers
- 991031665034104646
Conference proceeding
Measuring the EUV-induced contamination rates of TiO2-capped multilayer optics by anticipated production-environment hydrocarbons
Proceedings of SPIE, the International Society for Optical Engineering, Vol.7271
Alternative lithographic technologies (24-26 February 2009, San Jose, California, United States)
2009
Metrics
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