Materials and Process Integration Issues in Metal Gate/High-k Stacks and Their Dependence on Device Performance

Journal article

Alessandro Callegari, Katherina Babich, Sufi Zafar, Vijay Narayanan, Takashi Ando and Philip E Batson

ECS transactions, Vol.11(4), pp.265-274

12/19/2019

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Title: Materials and Process Integration Issues in Metal Gate/High-k Stacks and Their Dependence on Device Performance
Creators: Alessandro Callegari
Katherina Babich
Sufi Zafar
Vijay Narayanan
Takashi Ando
Philip E Batson
Publication Details: ECS transactions, Vol.11(4), pp.265-274
Date published: 12/19/2019
Academic Unit: Physics and Astronomy (SAS)
Language: English
Resource Type: Journal article
Identifiers: 991031666046604646